EP 507 - Semiconductor Fabrication & Characterization
- Credit Hours: 2R-6L-4C
- Term Available: F
- Graduate Studies Eligible: No
- Prerequisites: PH 405 or consent of instructor
- Corequisites: None
Fabrication and characterization of micro/nanoelectronic devices; Semiconductor devices; Oxidation, ion implantation, etching, deposition, lithography, and back-end processing; Process integration of various technologies, including CMOS, double poly bipolar junction transistor, and GaAs MESFET. Process and device simulators illustrate concepts introduced in class. Modern tools/techniques for both bulk- and thin-film characterization; Laboratory is an integral component of this class. Students work in teams to fabricate a multi-junction semiconductor device, using various techniques which include photolithography, diffusion, oxidation, and etching. In-process measurement results are compared with final electrical test results. Circuits are used to carry out performance evaluation. Students must do additional project work on a topic selected by the instructor. Students may not receive credit for both EP 407 and EP 507.